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dc.contributor.authorHsu, Po-yaen_US
dc.date.accessioned2015-01-07T20:57:37Z
dc.date.available2019-08-19T06:02:09Z
dc.date.issued2014-08-18en_US
dc.identifier.otherbibid: 8793432
dc.identifier.urihttps://hdl.handle.net/1813/38900
dc.language.isoen_USen_US
dc.subjectPLDen_US
dc.subjectTantalum oxideen_US
dc.titleTantalum Oxide And Ge-Incorporated Tantalum Oxide Prepared By Pulsed Laser Deposition For High-K Dielectric Applicationsen_US
dc.typedissertation or thesisen_US
thesis.degree.disciplineMaterials Science and Engineering
thesis.degree.grantorCornell Universityen_US
thesis.degree.levelMaster of Science
thesis.degree.nameM.S., Materials Science and Engineering
dc.contributor.chairVan Dover, Robert B.en_US
dc.contributor.committeeMemberUmbach, Christopher Cutleren_US


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