Tantalum Oxide And Ge-Incorporated Tantalum Oxide Prepared By Pulsed Laser Deposition For High-K Dielectric Applications
| dc.contributor.author | Hsu, Po-ya | en_US |
| dc.contributor.chair | Van Dover, Robert B. | en_US |
| dc.contributor.committeeMember | Umbach, Christopher Cutler | en_US |
| dc.date.accessioned | 2015-01-07T20:57:37Z | |
| dc.date.available | 2019-08-19T06:02:09Z | |
| dc.date.issued | 2014-08-18 | en_US |
| dc.identifier.other | bibid: 8793432 | |
| dc.identifier.uri | https://hdl.handle.net/1813/38900 | |
| dc.language.iso | en_US | en_US |
| dc.subject | PLD | en_US |
| dc.subject | Tantalum oxide | en_US |
| dc.title | Tantalum Oxide And Ge-Incorporated Tantalum Oxide Prepared By Pulsed Laser Deposition For High-K Dielectric Applications | en_US |
| dc.type | dissertation or thesis | en_US |
| thesis.degree.discipline | Materials Science and Engineering | |
| thesis.degree.grantor | Cornell University | en_US |
| thesis.degree.level | Master of Science | |
| thesis.degree.name | M.S., Materials Science and Engineering |
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