USING THE COUPLED MICRO-REACTOR/UHV SURFACE ANALYSIS SYSTEM AND THE QCM-BASED VISCOUS FLOW REACTOR TO STUDY AREA-SELECTIVE DEPOSITION
| dc.contributor.author | Wang, Yen-Hsiung | |
| dc.contributor.chair | Engstrom, James R. | |
| dc.contributor.committeeMember | DiStasio, Jr, Robert A. | |
| dc.date.accessioned | 2021-12-20T20:34:41Z | |
| dc.date.available | 2021-12-20T20:34:41Z | |
| dc.date.issued | 2021-08 | |
| dc.description | 109 pages | |
| dc.description.abstract | Patterning during a nanofabrication process could be designed with a variety of techniques to manifest spatial control of chemical reactions and it is categorized as a top-down or a bottom-up process in general. While the state-of-the-art top-down techniques meet challenges, a bottom-up deposition process shows advantages in some aspects. In our research, we focus our work on modified process of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to achieve area-selective deposition (ASD). We have been trying to find a pathway to achieve ASD with the formation of a reversible blocking layer exclusively on the non-growth surface. During the deposition process, a third gas-phase molecule, what we refer to as “co-adsorbate”, is introduced to compete for adsorption sites on the non-growth surface while leave precursor adsorption unimpeded on the growth surface. It is a very promising approach mainly due to the self-aligning and high-throughput essence. | |
| dc.identifier.doi | https://doi.org/10.7298/bf5e-my57 | |
| dc.identifier.other | Wang_cornell_0058O_11287 | |
| dc.identifier.other | http://dissertations.umi.com/cornell:11287 | |
| dc.identifier.uri | https://hdl.handle.net/1813/110475 | |
| dc.language.iso | en | |
| dc.subject | ALD | |
| dc.subject | ASD | |
| dc.subject | CVD | |
| dc.subject | QCM | |
| dc.subject | XPS | |
| dc.title | USING THE COUPLED MICRO-REACTOR/UHV SURFACE ANALYSIS SYSTEM AND THE QCM-BASED VISCOUS FLOW REACTOR TO STUDY AREA-SELECTIVE DEPOSITION | |
| dc.type | dissertation or thesis | |
| dcterms.license | https://hdl.handle.net/1813/59810 | |
| thesis.degree.discipline | Chemical Engineering | |
| thesis.degree.grantor | Cornell University | |
| thesis.degree.level | Master of Science | |
| thesis.degree.name | M.S., Chemical Engineering |
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