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USING THE COUPLED MICRO-REACTOR/UHV SURFACE ANALYSIS SYSTEM AND THE QCM-BASED VISCOUS FLOW REACTOR TO STUDY AREA-SELECTIVE DEPOSITION

Author
Wang, Yen-Hsiung
Abstract
Patterning during a nanofabrication process could be designed with a variety of techniques to manifest spatial control of chemical reactions and it is categorized as a top-down or a bottom-up process in general. While the state-of-the-art top-down techniques meet challenges, a bottom-up deposition process shows advantages in some aspects. In our research, we focus our work on modified process of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to achieve area-selective deposition (ASD). We have been trying to find a pathway to achieve ASD with the formation of a reversible blocking layer exclusively on the non-growth surface. During the deposition process, a third gas-phase molecule, what we refer to as “co-adsorbate”, is introduced to compete for adsorption sites on the non-growth surface while leave precursor adsorption unimpeded on the growth surface. It is a very promising approach mainly due to the self-aligning and high-throughput essence.
Description
109 pages
Date Issued
2021-08Subject
ALD; ASD; CVD; QCM; XPS
Committee Chair
Engstrom, James R.
Committee Member
DiStasio, Jr, Robert A.
Degree Discipline
Chemical Engineering
Degree Name
M.S., Chemical Engineering
Degree Level
Master of Science
Type
dissertation or thesis