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  4. Study of the requirements for high-field operation in Gallium oxide devices

Study of the requirements for high-field operation in Gallium oxide devices

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File(s)
Cromer_cornellgrad_0058F_15310.pdf (243.61 MB)
No Access Until
2028-01-08
Permanent Link(s)
https://doi.org/10.7298/a66x-pp94
https://hdl.handle.net/1813/121082
Collections
Cornell Theses and Dissertations
Author
Cromer, Bennett
Abstract

Researchers have proven that β-Ga2O3 devices can match state of the artSiC power devices. However, further advancement for both higher breakdown voltages and thus higher surface electric fields is needed to entice adoption of β-Ga2O3 power electronics. This dissertation provides a holistic discussion of the material requirementsfor high-field operation of gallium oxide, starting from closed-form descriptions of current transport. We initially provide a review of on-state current mecha- nism to provide a framework of injection-limited and conduction-limited trans- port. We use this to probe the minimum requirements for off-state injection- limited and conduction-limited transport to approach intrinsic breakdown at commercially-comparable reverse leakage current densities. With these minimum requirements guiding anode design, we utilize the col-laborative development of novel low-energy deposition methods such as ozone- MBE and mist-CVD to create highly-uniform and high-quality junctions. In the case of crystalline metal oxides IrO2, RuO2, and PtO, peak surface electric fields exceeding 6 MV/cm are realized with barrier heights nearing and exceeding 2 eV. We further critically assess the predominant p-type material used for Ga2O3 heterojunctions and demonstrate a high-quality one-sided interface for both P- N junctions and anode-connected p-NiO field plates. We further observe from the closed-form mechanisms that compensating de-fects deeper than 1 eV exceed the minimum requirement to approach intrinsic breakdown. We demonstrate, in plain language, the distinction between acti- vating a deep-level dopant and observing resistive behavior. We further show a use case of assessing the presence of shallow defects and if they inhibit resistive behavior in both DC and switching operation.

Description
281 pages
Date Issued
2025-12
Keywords
diode
•
electronic transport
•
gallium oxide
•
power electronics
•
ultra wide band gap
Committee Chair
Xing, Huili
Committee Member
Jena, Debdeep
Rana, Farhan
Degree Discipline
Materials Science and Engineering
Degree Name
Ph. D., Materials Science and Engineering
Degree Level
Doctor of Philosophy
Rights
Attribution 4.0 International
Rights URI
https://creativecommons.org/licenses/by/4.0/
Type
dissertation or thesis

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