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  4. Low-Frequency Noise in III-V Nitride 2D Electron and Hole Gases

Low-Frequency Noise in III-V Nitride 2D Electron and Hole Gases

File(s)
Nima_Leclerc_Honors_Thesis_CORNELL2020.pdf (1.17 MB)
Permanent Link(s)
https://doi.org/10.7298/2p3y-9q97
https://hdl.handle.net/1813/102812
Collections
College of Engineering Honors Theses
Author
Leclerc, Nima
Abstract

Following the use of the Mg-doped GaN for p-channel transistor channels, the manipulation of holes and their interactions with phonons, impurities, and dislocations remains a fundamental challenge. p-channel GaN electronics have received recent interest due to the relatively high hole mobility in AlN-GaN polarization induced two-dimensional hole gases (2DHGs). Although the mobility-limiting scattering mechanisms in 2DHGs is understood, the origins of 1/f noise in these channels is not. We introduce a characterization technique and stochastic model to identify 1/f noise mechanisms in a two-dimensional electron gas which can be extended to the 2DHG.

Date Issued
2020-05-23
Rights
CC0 1.0 Universal
Rights URI
http://creativecommons.org/publicdomain/zero/1.0/
Type
dissertation or thesis

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