Cornell University
Library
Cornell UniversityLibrary

eCommons

Help
Log In(current)
  1. Home
  2. Cornell University Graduate School
  3. Cornell Theses and Dissertations
  4. Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity

Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity

File(s)
wz89.pdf (4.53 MB)
Permanent Link(s)
https://hdl.handle.net/1813/43730
Collections
Cornell Theses and Dissertations
Author
Zhang, Wenyu
Date Issued
2016-02-01
Keywords
Atomic layer deposition
•
XPS, LEISS, selective deposition
•
Thin film continuity
Committee Chair
Engstrom,James R
Committee Member
Hanrath,Tobias
Schlom,Darrell
Degree Discipline
Chemical Engineering
Degree Name
Ph. D., Chemical Engineering
Degree Level
Doctor of Philosophy
Type
dissertation or thesis

Site Statistics | Help

About eCommons | Policies | Terms of use | Contact Us

copyright © 2002-2026 Cornell University Library | Privacy | Web Accessibility Assistance