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Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity

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dc.contributor.authorZhang, Wenyu
dc.contributor.chairEngstrom,James R
dc.contributor.committeeMemberHanrath,Tobias
dc.contributor.committeeMemberSchlom,Darrell
dc.date.accessioned2016-04-04T18:06:29Z
dc.date.available2021-02-01T07:00:49Z
dc.date.issued2016-02-01
dc.identifier.otherbibid: 9597280
dc.identifier.urihttps://hdl.handle.net/1813/43730
dc.language.isoen_US
dc.subjectAtomic layer deposition
dc.subjectXPS, LEISS, selective deposition
dc.subjectThin film continuity
dc.titleStudy Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity
dc.typedissertation or thesis
thesis.degree.disciplineChemical Engineering
thesis.degree.grantorCornell University
thesis.degree.levelDoctor of Philosophy
thesis.degree.namePh. D., Chemical Engineering

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