Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity

Zhang, Wenyu2016-04-042021-02-012016-02-01bibid: 9597280https://hdl.handle.net/1813/43730en-USAtomic layer depositionXPS, LEISS, selective depositionThin film continuityStudy Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivitydissertation or thesis