2026-09-20T01:28:34Zhttps://ecommons.cornell.edu/server/oai/requestoai:ecommons.cornell.edu:1813/437302026-05-14T13:53:29Zcom_1813_35col_1813_47
Zhang, Wenyu
Engstrom,James R
Hanrath,Tobias
Schlom,Darrell
2016-04-04T18:06:29Z
2021-02-01T07:00:49Z
2016-02-01
https://hdl.handle.net/1813/43730
9597280
en_US
Atomic layer deposition
XPS, LEISS, selective deposition
Thin film continuity
Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity
dissertation or thesis
application/pdf
Chemical Engineering
Cornell University
Doctor of Philosophy
Ph. D., Chemical Engineering
Publication
Cornell Theses and Dissertations
Zhang, Wenyu
5893a6ea-7af3-41d7-abc6-04bcd26ab5df
open.access
open.access
<Publication xmlns="https://www.openaire.eu/cerif-profile/1.1/" id="0c4cb632-4b19-4c89-9ce6-acac91b658c4">
<Type xmlns="https://www.openaire.eu/cerif-profile/vocab/COAR_Publication_Types">http://purl.org/coar/resource_type/c_1843</Type>
<Language>en_US</Language>
<Title>Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity</Title>
<PublishedIn>
<Publication>
</Publication>
</PublishedIn>
<PublicationDate>2016-02-01</PublicationDate>
<Authors>
<Author>
<DisplayName>Zhang, Wenyu</DisplayName>
<Affiliation>
<OrgUnit>
</OrgUnit>
</Affiliation>
</Author>
</Authors>
<Editors>
</Editors>
<Publishers>
<Publisher>
<OrgUnit />
</Publisher>
</Publishers>
<Keyword>Atomic layer deposition</Keyword>
<Keyword>XPS, LEISS, selective deposition</Keyword>
<Keyword>Thin film continuity</Keyword>
<Access xmlns="http://purl.org/coar/access_right"
>
</Access>
</Publication>