2026-09-19T07:02:26Zhttps://ecommons.cornell.edu/server/oai/requestoai:ecommons.cornell.edu:1813/1029992026-05-15T19:41:23Zcom_1813_35col_1813_47
QIU, YUFENG
Joo, Yong L.
Ober, Christopher Kemper
Wiesner, Uli B.
2021-03-12T17:40:35Z
2021-03-12T17:40:35Z
2020-08
ProQuest Submission ID: 10997
ProQuest Publication ID: 28030645
https://hdl.handle.net/1813/102999
https://doi.org/10.7298/vk1y-s084
13277687
71 pages
Directed self-assembly (DSA) of block copolymer (BCP) is a promising and economic method of manufacturing periodic lamellar patterns on wafer that is widely used in semi-conductor and electronic fields. In BCP DSA lithography, same as issues in achieving defective free patterns and smooth edges, an evenly distributed width line space pattern is also critical but in lack of research. Comparing with experiment, simulation has many advantages on cost, accuracy and repeatability. Simulation has been very successful in predicting physical behaviors of systems and guiding the experiments. In this research, a coarse grained molecular dynamic (CGMD) simulation on polystyrene-b-poly (methyl methacrylate) (PS-b-PMMA) block copolymer DSA process using chemoepitaxial method was carried out. By changing BCP composition, substrate properties including topography and interaction strength, their effects on produced lamellae critical dimension (CD) variation, line space variation, roughness and tapering effect were investigated. It gives the direction of optimizing the substrate structure.
en
block copolymer
directed self assembly
simulation
topographic substrate
Coarse grained molecular dynamic of block copolymer directed self assembly on topographic substrate
dissertation or thesis
https://catalog.library.cornell.edu/catalog/13277687
application/pdf
Chemical Engineering
Cornell University
Master of Science
M.S., Chemical Engineering
https://hdl.handle.net/1813/59810
Publication
Cornell Theses and Dissertations
QIU, YUFENG
5893a6ea-7af3-41d7-abc6-04bcd26ab5df
open.access
open.access
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<Abstract>Directed self-assembly (DSA) of block copolymer (BCP) is a promising and economic method of manufacturing periodic lamellar patterns on wafer that is widely used in semi-conductor and electronic fields. In BCP DSA lithography, same as issues in achieving defective free patterns and smooth edges, an evenly distributed width line space pattern is also critical but in lack of research. Comparing with experiment, simulation has many advantages on cost, accuracy and repeatability. Simulation has been very successful in predicting physical behaviors of systems and guiding the experiments. In this research, a coarse grained molecular dynamic (CGMD) simulation on polystyrene-b-poly (methyl methacrylate) (PS-b-PMMA) block copolymer DSA process using chemoepitaxial method was carried out. By changing BCP composition, substrate properties including topography and interaction strength, their effects on produced lamellae critical dimension (CD) variation, line space variation, roughness and tapering effect were investigated. It gives the direction of optimizing the substrate structure.</Abstract>
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