Block copolymer derived mesoporous thin films: processing, characterization, and applications

Du, Phong

Block copolymer derived mesoporous thin films: processing, characterization, and applications

Abstract

The development of diblock copolymers as structure directing agents for phase selective additives to generate thin films is discussed. Different systems ranging from pure organic [(poly(alpha-methyl styrene-block-4-hydroxystyrene) and poly(alpha styrene-block- isoprene) with photoactive crosslinkers] to an organic-inorganic [poly(isoprene-block- ethylene oxide) with 3-glycidyloxypropyltrimethoxysilane and aluminum-tri-sec-butoxide] to a non-oxide high temperature system [poly(isoprene-block-dimethylamino ethylmethacrylate) with a polyureamethylvinylsilazane additive] are explored. Characterization is accomplished through a variety of techniques (atomic force microscopy, scanning electron microscopy, grazing incidence small angle x-ray scattering, nuclear magnetic resonance, and Rutherford backscattering) and supplemented by quantitative analysis (radial and bond orientation distribution functions, Voronoi diagrams, and GISAXS simulations). Hybrid organic-inorganic mesoporous monolayer thin films are used as templates to structure silicon at the 30 nm length scale through a transient laser induced melt and capillarity driven pore filling process.

Description

Prof. Ulrich Wiesner, Prof. Michael O. Thompson, Prof. Jack M. Blakely

Date Issued

2006-05-05T19:02:42Z

Publisher

Wiley

Keywords

block copolymer, thin films, sol-gel, nanocomposite, organic-inorganic hybrid, laser annealing

Has Other Format(s)

bibid: 6476109

Previously Published As

Du, P et al "Additive-driven phase-selective chemistry in block copolymer thin films: the convergence of top-down and bottom-up approaches Adv. Mater., 16 (12), 953, 2004

Types

article