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Direct Measurements of Island Growth and Step-Edge Barriers in Colloidal Epitaxy

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dc.contributor.authorGanapathy, R.
dc.contributor.authorBuckley, M.R.
dc.contributor.authorGerbode, S.J.
dc.contributor.authorCohen, I.
dc.date.accessioned2011-07-28T16:05:01Z
dc.date.available2011-07-28T16:05:01Z
dc.date.issued2010-01-22
dc.descriptionhttp://www.aaas.org/en_US
dc.description.abstractEpitaxial growth, a bottom-up self-assembly process for creating surface nano-and microstructures, has been extensively studied in the context of atoms. This process, however, is also a promising route to self-assembly of nanometer- and micrometer-scale particles into microstructures that have numerous technological applications. To determine whether atomic epitaxial growth laws are applicable to the epitaxy of larger particles with attractive interactions, we investigated the nucleation and growth dynamics of colloidal crystal films with single-particle resolution. We show quantitatively that colloidal epitaxy obeys the same two-dimensional island nucleation and growth laws that govern atomic epitaxy. However, we found that in colloidal epitaxy, step-edge and corner barriers that are responsible for film morphology have a diffusive origin. This diffusive mechanism suggests new routes toward controlling film morphology during epitaxy.en_US
dc.description.sponsorshipWe thank L. Ristroph, J. Savage, T. Arias, J. Machta, and A. Woll for useful discussions. We would like to especially thank J. Sethna for helping us set up the numerical calculations for residence times. This research was supported by grants from the NSF Division of Materials Research, the Cornell NanoScale Science and Technology Facility, and in part by award no. KUS-C1-018-02 from King Abdullah University of Science and Technology (KAUST).en_US
dc.identifier.citationSCIENCE, 327 (5964),445-448, JAN 22 2010en_US
dc.identifier.issn0036-8075
dc.identifier.otherDOI: 10.1126/science.1179947   
dc.identifier.otherIDS Number: 546BS
dc.identifier.urihttps://hdl.handle.net/1813/23435
dc.language.isoenen_US
dc.publisherAMER ASSOC ADVANCEMENT SCIENCE, 1200 NEW YORK AVE, NW, WASHINGTON, DC 20005 USAen_US
dc.subjectTHIN-FILM GROWTHen_US
dc.subjectNUCLEATIONen_US
dc.subjectCRYSTALSen_US
dc.subjectNANOSTRUCTURESen_US
dc.subjectDIFFUSIONen_US
dc.subjectPARTICLESen_US
dc.subjectDYNAMICSen_US
dc.subjectSURFACESen_US
dc.subjectVIEWen_US
dc.titleDirect Measurements of Island Growth and Step-Edge Barriers in Colloidal Epitaxyen_US
dc.typearticleen_US

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