Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity

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2021-02-01
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http://hdl.handle.net/1813/43730
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Author
Zhang, Wenyu
Date Issued
2016-02-01
Subject
Atomic layer deposition; XPS, LEISS, selective deposition; Thin film continuity
Committee Chair
Engstrom,James R
Committee Member
Hanrath,Tobias; Schlom,Darrell
Degree Discipline
Chemical Engineering
Degree Name
Ph.D. of Chemical Engineering
Degree Level
Doctor of Philosophy
Type
dissertation or thesis

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