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Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity
Date Issued
2016-02-01Subject
Atomic layer deposition; XPS, LEISS, selective deposition; Thin film continuity
Committee Chair
Engstrom,James R
Committee Member
Hanrath,Tobias; Schlom,Darrell
Degree Discipline
Chemical Engineering
Degree Name
Ph. D., Chemical Engineering
Degree Level
Doctor of Philosophy
Type
dissertation or thesis