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dc.contributor.authorPinge, Shubham
dc.date.accessioned2016-04-04T18:06:06Z
dc.date.issued2016-02-01
dc.identifier.otherbibid: 9597223
dc.identifier.urihttps://hdl.handle.net/1813/43701
dc.description.abstractBlock copolymers (BCPs) self organize at molecular level building blocks and forming nano-structures with characteristic length scales. As these nano-structures resemble the lithographic features desired in the micro-electronics industry, they are used as a nanotemplate in the manufacture of micro-chips. This study focusses on the pillarpost guide method of directing self assemblies to form 'punch hole' lithographic nano-patterns. The work aims to elucidate the necessary conditions required to form hexagonal packed cylinders using di-block copolymers. It sheds lights on various factors that affect the BCP self assembly and how the morphology is altered due to these factors. These include biasing the surfaces (selective towards one of the BCP phase) and altering the BCP properties (chain length, volume fraction etc). The morphologies attained have been independently verified by experimental results obtained from our collaborators at EMD Performance Materials Group, NJ-USA. Apart from optimizing the morphology of the system, fundamental studies have been performed on the system. The behavior of the BCP chains is analyzed under a simple confinement between two flat substrates that selectively wets one of the phases. The morphology thus formed is studied with the polymer chain length being the reaction coordinate for a fixed critical confinement. The results obtained from the fundamental study has helped us in explaining the morphology formed in a more complex geometry like pillarpost guide that uses topography to confine the polymers. This in turn has proven to be of great benefit to optimally design the system and achieve the ideal nanolithographic patterns. iii
dc.language.isoen_US
dc.subjectBlock Copolymers
dc.subjectLithography
dc.subjectMolecular Dynamics
dc.titleMesoscale Modeling Of Directed Self Assemblies Of Block Copolymer Lithography
dc.typedissertation or thesis
dc.description.embargo2021-02-01
thesis.degree.disciplineChemical Engineering
thesis.degree.grantorCornell University
thesis.degree.levelMaster of Science
thesis.degree.nameM.S., Chemical Engineering
dc.contributor.chairJoo,Yong L.
dc.contributor.committeeMemberDaniel,Susan
dc.contributor.committeeMemberClancy,Paulette


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