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Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity

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Abstract

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Date Issued

2016-02-01

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Keywords

Atomic layer deposition; XPS, LEISS, selective deposition; Thin film continuity

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Committee Chair

Engstrom,James R

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Committee Member

Hanrath,Tobias
Schlom,Darrell

Degree Discipline

Chemical Engineering

Degree Name

Ph. D., Chemical Engineering

Degree Level

Doctor of Philosophy

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Government Document

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dissertation or thesis

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